Fraunhofer Institute for Microstructure of Materials and Systems IMWS
The development of microelectronic applications requires high-performance, ultra-pure starting materials. In collaboration with PSC Polysilane Chemistry GmbH, the Fraunhofer Institute for Microstructure of Materials and Systems IMWS in Halle (Saale) is working on the “SilaTec” project to develop a modular process and analytical platform for the production, purification, and quality control of such precursor materials. The goal is to transition promising materials from the laboratory to industry-scale production, thereby laying the foundation for future applications in the semiconductor industry.
The focus is particularly on next-generation halogenated and hydrogenated oligosilanes. These compounds are required for modern deposition processes such as atomic layer deposition (ALD) and chemical vapor deposition (CVD), which play a central role in the manufacture of microchips and electronic components. The new materials are expected to offer improved properties compared to currently available precursors and, in the long term, will be made available for future generations of microelectronics technology.
A key contribution of Fraunhofer IMWS lies in the development of highly sensitive analytical methods for determining impurities in the ultra-trace range. “For electronic applications, even the smallest contaminants must be reliably detected, as they can affect the performance and reliability of components. To this end, we are developing specialized sample preparation methods for various silane compounds to be analyzed using inductively coupled plasma mass spectrometry (ICP-MS),” says Stefanie Wahl, project manager at Fraunhofer IMWS. This enables even trace amounts of contaminants in the sub-ppb to ppt range (down to a few picograms of contaminant per gram of sample) to be reliably detected.
Fraunhofer IMWS provides analytical support for the development of new precursor materials throughout the entire process chain. In addition to determining impurity levels, the institute evaluates the effectiveness of individual purification strategies and identifies potential sources of contamination. The analytical results are directly incorporated into the optimization of manufacturing and purification processes at PSC GmbH and contribute to the development of robust, industrially scalable production processes.
While PSC Polysilane Chemistry GmbH is responsible for the synthesis, purification, and upscaling of the precursors, the Fraunhofer IMWS focuses on analytically verifying the material quality achieved. Together, they are creating an end-to-end process chain ranging from material development and quality assessment to the preparation for industrial production. The goal is to ensure a rapid transition from the laboratory scale to industrial production environments as the demand for next-generation precursors in the industry increases.
With its many years of experience in ultra-trace analysis and the characterization of high-purity materials, the Fraunhofer IMWS is making an important contribution to the development of future key technologies. The project strengthens collaboration between research and industry and helps ensure the long-term supply of high-purity specialty chemicals to the semiconductor industry.
(August 18, 2026)