Fraunhofer Institute for Microstructure of Materials and Systems IMWS
Scanning electron microscopy (SEM) is an advanced imaging technique used at Fraunhofer IMWS to generate high-resolution images of surfaces. Unlike conventional light microscopy, SEM uses electron beams instead of light to illuminate the object and capture detailed images.
How scanning electron microscopy works
In SEM, an electron beam is directed at the surface of the object being examined. This beam interacts with the surface and generates various signals such as secondary electrons, backscattered electrons, or X-rays. These signals are then detected and converted into an image. SEM offers much higher resolution than light microscopy, which means that even the smallest details on the surface of the object can be made visible. This enables the examination of material structures, surface morphologies, particle sizes, and other features on the micro and nanoscale.
A special feature of the SEM is its ability to scan the object step by step and create a three-dimensional image. This enables detailed analysis of the surface structure and accurate measurement of particles or structures.
Fields of application for scanning electron microscopy
SEM is used in various fields such as materials science, nanotechnology, biology, geology, forensics, and many other areas. It is an indispensable tool for researching and characterizing materials and surfaces at the microscopic level. The Fraunhofer IMWS has state-of-the-art equipment available for this purpose. Our scientific staff has extensive expertise and knowledge of scanning electron microscopy and the interpretation of SEM images in order to correctly analyze and interpret the information obtained.